DocumentCode
30913
Title
High-Q photonic crystal cavities realised using deep ultraviolet lithography
Author
Welna, K. ; Debnath, K. ; Krauss, T.F. ; O´Faolain, L.
Author_Institution
Sch. of Phys. & Astron., Univ. of St. Andrews, St. Andrews, UK
Volume
51
Issue
16
fYear
2015
fDate
8 6 2015
Firstpage
1277
Lastpage
1279
Abstract
Deep-ultraviolet lithography is essential for the mass production of silicon devices. To date, restrictions in the process have prevented the realisation of high-Q-factor optical resonators. This reported work demonstrates photonic crystal cavities with Q-factor values of ~200 000 using an optimised design.
Keywords
elemental semiconductors; optical resonators; photonic crystals; silicon; ultraviolet lithography; Si; deep ultraviolet lithography; high-Q photonic crystal cavities; high-Q-factor optical resonators; silicon devices mass production;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el.2015.1120
Filename
7175155
Link To Document