Title :
Architecture design exploration of three-dimensional (3D) integrated DRAM
Author :
Anigundi, Rakesh ; Sun, Hongbin ; Lu, Jian-Qiang ; Rose, Ken ; Zhang, Tong
Author_Institution :
Rensselaer Polytech. Inst., Troy, NY
Abstract :
Motivated by increasingly promising three-dimensional (3D) integration technologies, this paper reports an architecture design of 3D integrated dynamic RAM (DRAM). To accommodate the potentially significant pitch mismatch between DRAM word-line/bit-line and through silicon vias (TSVs) for 3D integration, this paper presents two modestly different coarse-grained inter-sub-array 3D DRAM architecture partitioning strategies. Furthermore, to mitigate the potential yield loss induced by 3D integration, we propose an interdie inter-sub-array redundancy repair approach to improve the memory repair success rate. For the purpose of evaluation, we modified CACTI 5 to support the proposed coarse-grained 3D partitioning strategies. Estimation results show that, for the realization of a 1 Gb DRAM with 8 banks and 256-bit data I/O, such 3D DRAM design strategies can effectively reduce the silicon area, access latency, and energy consumption compared with 3D packaging with wire bonding and conventional 2D design. We further developed a memory redundancy repair simulator to demonstrate the effectiveness of proposed inter-die inter-subarray redundancy repair approach.
Keywords :
DRAM chips; energy consumption; integrated circuit design; integrated circuit yield; redundancy; 3D integrated DRAM; CACTI 5; DRAM word-line/bit-line; architecture design exploration; coarse-grained 3D partitioning strategies; data I/O; energy consumption; memory redundancy repair simulator; pitch mismatch; potential yield loss; storage capacity 1 Gbit; storage capacity 256 bit; through silicon vias; Bandwidth; Bonding; Delay; Integrated circuit interconnections; Packaging; Random access memory; Silicon; Through-silicon vias; Wafer scale integration; Wire; 3D integration; DRAM;
Conference_Titel :
Quality of Electronic Design, 2009. ISQED 2009. Quality Electronic Design
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-4244-2952-3
Electronic_ISBN :
978-1-4244-2953-0
DOI :
10.1109/ISQED.2009.4810274