Title :
Analysis of plasmon excited by Metal-Insulator-Metal structure with insulator thickness of hundreds of nanometers
Author :
Tamura, Masaya ; Kagata, Hiroshi
Author_Institution :
Corp. Components Dev. Center, Panasonic Electron. Devices Co., Ltd., Kadoma, Japan
Abstract :
This paper presents the analysis of plasmon excited by Metal-Insulator-Metal (MIM) structure with insulator thickness of hundreds of nanometers. Since the surface plasmons on each metal excited by the electromagnetic waves that enters the MIM structure is coupled to each other, the incident wave is probably absorbed. At that time, the standing wave is generated in the insulator. We explain the principle of the MIM structure by confirming it with an electromagnetic simulator. We also confirm that the surface plasmon resonant wave is changed by the variation of the insulator thickness. Furthermore, the MIM structure´s resonant wavelengths are calculated using a multilayer filter approach and shows good agreement with 3D simulation and measurement.
Keywords :
MIM structures; surface plasmons; electromagnetic simulator; electromagnetic waves; incident wave; insulator thickness; metal-insulator-metal structure; multilayer filter approach; plasmon analysis; surface plasmon resonant wave; surface plasmons; Electromagnetic coupling; Electromagnetic scattering; Filters; Insulation; Metal-insulator structures; Nonhomogeneous media; Plasmons; Resonance; Surface waves; Wavelength measurement; electromagnetic wave; negative permittivity; plasmon; plasmon-polariton; sensor;
Conference_Titel :
Microwave Symposium Digest (MTT), 2010 IEEE MTT-S International
Conference_Location :
Anaheim, CA
Print_ISBN :
978-1-4244-6056-4
Electronic_ISBN :
0149-645X
DOI :
10.1109/MWSYM.2010.5515132