• DocumentCode
    30979
  • Title

    Electrically doped dynamically configurable field-effect transistor for low-power and high-performance applications

  • Author

    Lahgere, A. ; Sahu, C. ; Singh, J.

  • Author_Institution
    Dept. of Electron. & Commun. Eng., PDPM Indian Inst. of Inf. Technol. Design & Manuf., Jabalpur, India
  • Volume
    51
  • Issue
    16
  • fYear
    2015
  • fDate
    8 6 2015
  • Firstpage
    1284
  • Lastpage
    1286
  • Abstract
    The concept of an electrically doped dynamically configurable field-effect transistor (FET) is presented, which provides freedom to dynamically switch between a high-performance MOSFET and a low-power tunnel FET that can be ideal for complementary circuit implementation. The charge carrier concentration, polarity and conduction mechanism of the device are precisely controlled by the appropriate application of an external polarity control signal, instead of the conventional ion-implantation process. Two-dimensional TCAD simulation results confirm the dynamic configuration of the proposed device and good functionality agreement with existing devices as well as it having the requisite qualities for low-power and high-performance applications.
  • Keywords
    MOSFET; ion implantation; low-power electronics; tunnel transistors; 2D TCAD simulation; charge carrier concentration; complementary circuit implementation; conduction mechanism; device polarity; dynamic configuration; electrically-doped dynamically configurable FET; electrically-doped dynamically configurable field-effect transistor; high-performance MOSFET; ion-implantation process; low-power TFET; low-power high-performance application; metal-oxide-semiconductor field-effect; polarity control signal; tunnel FET; two-dimensional TCAD simulation;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el.2015.0079
  • Filename
    7175161