• DocumentCode
    309809
  • Title

    SDSTM gas source feed material systems for ion implantation

  • Author

    Brown, R.L.

  • Author_Institution
    Microelectron. Div., IBM, Essex Junction, VT, USA
  • fYear
    1996
  • fDate
    16-21 Jun 1996
  • Firstpage
    311
  • Lastpage
    314
  • Abstract
    The introduction of arsine and phosphine in an atmospheric cylinder provides a safer alternative for users of high pressure hydrides and an alternative for users of solid materials that provides increased productivity. This paper is an overview of an SDS gas source installation at IBM. Concern with respect to SDS applications in high current machines is addressed. Safety aspects and emission treatment are also discussed
  • Keywords
    gases; integrated circuit manufacture; ion implantation; materials handling; safety; AsH3; IBM; PH3; Zeolite 5A; atmospheric cylinder; emission treatment; gas source feed material systems; gas source installation; high current machines; high pressure hydrides; ion implantation; productivity; safe delivery sources; safety aspects; semiconductor manufacturing; Control systems; Costs; Feeds; Fluid flow measurement; Implants; Ion implantation; Ion sources; Pressure control; Transducers; Weight control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ion Implantation Technology. Proceedings of the 11th International Conference on
  • Conference_Location
    Austin, TX
  • Print_ISBN
    0-7803-3289-X
  • Type

    conf

  • DOI
    10.1109/IIT.1996.586271
  • Filename
    586271
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=309809