• DocumentCode
    309811
  • Title

    Some basic considerations of sector magnets

  • Author

    Nobes, M.J. ; McLaren, M.G.

  • Author_Institution
    Inst. of Sci. Res., Salford Univ., UK
  • fYear
    1996
  • fDate
    16-21 Jun 1996
  • Firstpage
    379
  • Lastpage
    382
  • Abstract
    Since sector field magnets are widely used in ion implanters and isotope separators, it is appropriate that designers and operators appreciate their limitations through an ability to trace the path of charged particles in magnetic fields. This paper considers a sector magnet with variable angle pole tips. Initially, the direction and displacement of output rays, relative to magnet reference points, are deduced. This leads to an expression for the image distance in terms of the source distance, the sector included angle, and the angles of incidence and exit of input and output beams. The magnetic field of sector magnets extends beyond the physical boundary of the magnet itself and this fringe field can influence the path of incident particles before they enter the hard field boundary. Assuming an analytical expression for the fringe field variation, its influence on particle path radius and effective increase in magnetic volume can be estimated. Finally, the isotopic resolving power of a given sector field magnet may be calculated
  • Keywords
    beam handling techniques; electromagnets; ion beams; ion implantation; isotope separation; magnetic fields; charged particle path tracing; fringe field; geometric considerations; image distance; ion beam behaviour; ion implanters; isotope separators; isotopic resolving power; magnetic fields; magnetic volume; output ray direction; output ray displacement; particle path radius; sector field magnets; sector included angle; source distance; variable angle pole tips; Foundries; Implants; Ion beams; Isotopes; Magnetic analysis; Magnetic fields; Magnetic materials; Magnetic separation; Magnets; Particle separators;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ion Implantation Technology. Proceedings of the 11th International Conference on
  • Conference_Location
    Austin, TX
  • Print_ISBN
    0-7803-3289-X
  • Type

    conf

  • DOI
    10.1109/IIT.1996.586353
  • Filename
    586353