Title :
Complete management of implant misprocessing risk through computer automation
Author :
Axan, B. ; Pivin, L. ; Irle, J.
Author_Institution :
Motorola Inc., Mesa, AZ, USA
Abstract :
The implant area of virtually every production fab has some degree of protection against wafers receiving wrong implants. Host computer control has been used to eliminate the possibility of wrong implants, missing implants, and double implants throughout the implant area in spite of limitations imposed by implanters with varying degrees of software capabilities and hardware configurations, i.e., serial versus batch processing. The development of three complete host computer systems for all MOS6 Varian implanters has resulted in a methodology which can be applied to any manufacturing area
Keywords :
factory automation; ion implantation; process control; risk management; semiconductor device manufacture; MOS6 Varian implanter; computer automation; computer control; host computer system; ion implant misprocessing; risk management; semiconductor manufacturing; wafer processing; Automatic control; Computer aided manufacturing; Computer integrated manufacturing; Costs; Implants; Manufacturing automation; Manufacturing processes; Production; Risk management; Testing;
Conference_Titel :
Ion Implantation Technology. Proceedings of the 11th International Conference on
Conference_Location :
Austin, TX
Print_ISBN :
0-7803-3289-X
DOI :
10.1109/IIT.1996.586415
