Title :
Ion implantation of large wafers and flat panel displays
Author_Institution :
Superion Ltd., East Molesey, UK
Abstract :
Two end station concepts for large wafers and Flat Panel Displays (FPD) are described with regard to their application to both analysed and non-analysed ion beams. One is a batch scanning technique called disk with platen tilt (DPT) which allows horizontal wafer loading onto a disk which stays in the vertical plane for implant and loading; the other is Phased Linear Scanning (PLS) which is a near serial technique (2 wafers) offering substantial throughput advantages compared with single wafer implant for high dose implants
Keywords :
flat panel displays; ion implantation; analysed ion beam; batch scanning; disk with platen tilt; end station; flat panel display; ion implantation; large wafer; nonanalysed ion beam; phased linear scanning; serial technique; Costs; Flat panel displays; Heat sinks; Implants; Ion beams; Ion implantation; Particle beams; Spinning; Temperature; Throughput;
Conference_Titel :
Ion Implantation Technology. Proceedings of the 11th International Conference on
Conference_Location :
Austin, TX
Print_ISBN :
0-7803-3289-X
DOI :
10.1109/IIT.1996.586569
