DocumentCode
309824
Title
Ion implantation of large wafers and flat panel displays
Author
Aitken, Derek
Author_Institution
Superion Ltd., East Molesey, UK
fYear
1996
fDate
16-21 Jun 1996
Firstpage
780
Lastpage
783
Abstract
Two end station concepts for large wafers and Flat Panel Displays (FPD) are described with regard to their application to both analysed and non-analysed ion beams. One is a batch scanning technique called disk with platen tilt (DPT) which allows horizontal wafer loading onto a disk which stays in the vertical plane for implant and loading; the other is Phased Linear Scanning (PLS) which is a near serial technique (2 wafers) offering substantial throughput advantages compared with single wafer implant for high dose implants
Keywords
flat panel displays; ion implantation; analysed ion beam; batch scanning; disk with platen tilt; end station; flat panel display; ion implantation; large wafer; nonanalysed ion beam; phased linear scanning; serial technique; Costs; Flat panel displays; Heat sinks; Implants; Ion beams; Ion implantation; Particle beams; Spinning; Temperature; Throughput;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology. Proceedings of the 11th International Conference on
Conference_Location
Austin, TX
Print_ISBN
0-7803-3289-X
Type
conf
DOI
10.1109/IIT.1996.586569
Filename
586569
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