DocumentCode
3098935
Title
Characterization of Al2 O3 -HfO2 -Al2 O3 sandwiched MIM capacitor under DC and AC stresses
Author
Kwak, Ho-Young ; Kwon, Hyuk-Min ; Kwon, Sung-Kyu ; Jang, Jae-Hyung ; Choi, Woon-Il ; Chung, Yi-Sun ; Lee, Jong-Kon ; Lim, Min-Gyu ; Lee, Song-Jae ; Lee, Hi-Deok
Author_Institution
Dept. of Electron. Eng., Chungnam Nat. Univ., Daejeon, South Korea
fYear
2011
fDate
7-9 Dec. 2011
Firstpage
1
Lastpage
2
Abstract
In this work, three kinds of voltage stress, constant, unipolar, and bipolar voltage stresses are used to analyze the MIM capacitor with Al2O3/ HfO2/ Al2O3 structure. The relative variations of capacitance and voltage linearity show the greatest change by the bipolar voltage stress. The main cause of the variation of the capacitor parameters is due to the charge trapping during both the positive and negative bias regions.
Keywords
MIM devices; aluminium compounds; capacitors; hafnium compounds; AC stress; Al2O3-HfO2-Al2O3; DC stress; bipolar voltage stress; charge trapping; constant voltage stress; negative-bias region; positive-bias region; sandwiched MIM capacitor; unipolar voltage stress; voltage linearity; Aluminum oxide; Capacitance; Dielectrics; Hafnium compounds; MIM capacitors; Reliability; Stress;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Device Research Symposium (ISDRS), 2011 International
Conference_Location
College Park, MD
Print_ISBN
978-1-4577-1755-0
Type
conf
DOI
10.1109/ISDRS.2011.6135223
Filename
6135223
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