DocumentCode
3099114
Title
Charge pumping for DRAM retention diagnostic
Author
Adkisson, Jim ; Divakaruni, Rama ; Slinkman, Jim
Author_Institution
IBM Microelectron., Essex, VT, USA
fYear
1997
fDate
13-16 Oct 1997
Firstpage
97
Lastpage
102
Abstract
Charge pumping is an effective technique used extensively to analyze the interface state density of submicron MOSFETs. In essence, charge pumping measures the interface state density by pulsing the gate between inversion and accumulation. By filling traps with minority carriers in the inversion portion of the pulse, and allowing the minority carriers to recombine with majority carriers during the accumulation portion of the pulse, a DC current is generated in the body of the device. The magnitude of the charge-pumping current is then proportional to the number of pulses and the interface state density. We describe the use of charge pumping to diagnose retention behavior of DRAM arrays. This allows in-situ testing of the DRAM array device and, therefore, direct correlation to charge-retention characteristics of the functional 16 Mb DRAM chip. The concept is extendible to any DRAM cell. Our goal here was to correlate the charge-pumping current with retention failures in a DRAM to provide another diagnostic technique for retention learning
Keywords
DRAM chips; MOS memory circuits; dielectric thin films; electron traps; electronic density of states; hole traps; integrated circuit reliability; integrated circuit testing; interface states; minority carriers; 16 Mbit; DC current generation; DRAM array device; DRAM array retention behaviour; DRAM cell; DRAM chip; DRAM retention diagnostics; MOSFETs; charge pumping; charge-pumping current; charge-retention characteristics; diagnostic technique; gate inversion-accumulation pulsing; in-situ testing; interface state density; majority carriers; minority carrier recombination; minority carriers; retention failures; retention learning; trap filling; Charge measurement; Charge pumps; Current measurement; DC generators; Density measurement; Filling; Interface states; MOSFETs; Pulse generation; Random access memory;
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop Final Report, 1997 IEEE International
Conference_Location
Lake Tahoe, CA
Print_ISBN
0-7803-4205-4
Type
conf
DOI
10.1109/IRWS.1997.660295
Filename
660295
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