Title :
Extreme ultraviolet lithography with laser plasma sources
Author :
Kubiak, G.D. ; Tichenor, D.A. ; Stulen, R.H.
Keywords :
Electrons; Gratings; Lithography; Optical imaging; Optical sensors; Plasma sources; Resists; Spatial resolution; Ultraviolet sources; X-ray lasers;
Conference_Titel :
Lasers and Electro-Optics, 1995. Technical Digest. CLEO/Pacific Rim'95., Pacific Rim Conference on
Conference_Location :
Chiba, Japan
Print_ISBN :
0-7803-2400-5
DOI :
10.1109/CLEOPR.1995.521265
