• DocumentCode
    3100310
  • Title

    Extreme ultraviolet lithography with laser plasma sources

  • Author

    Kubiak, G.D. ; Tichenor, D.A. ; Stulen, R.H.

  • fYear
    1995
  • fDate
    10-14 July 1995
  • Firstpage
    45
  • Keywords
    Electrons; Gratings; Lithography; Optical imaging; Optical sensors; Plasma sources; Resists; Spatial resolution; Ultraviolet sources; X-ray lasers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 1995. Technical Digest. CLEO/Pacific Rim'95., Pacific Rim Conference on
  • Conference_Location
    Chiba, Japan
  • Print_ISBN
    0-7803-2400-5
  • Type

    conf

  • DOI
    10.1109/CLEOPR.1995.521265
  • Filename
    521265
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3100310