• DocumentCode
    3100708
  • Title

    Automated analysis of MOS-C relaxation time for WLR testing

  • Author

    Monroe, David K. ; Swanson, Scot E.

  • Author_Institution
    Reliability Phys. Dept., Sandia Nat. Labs., Albuquerque, NM, USA
  • fYear
    1997
  • fDate
    13-16 Oct 1997
  • Firstpage
    128
  • Lastpage
    129
  • Abstract
    Summary form only given. The relaxation time of a metal oxide semiconductor capacitor (MOS-C) is the time required for the restoration of thermal equilibrium, after being pulsed into deep depletion. Relaxation time has become widely used for monitoring wafer processing, because it is sensitive to the presence of contaminants. This paper describes and compares two automated techniques for analysis of capacitor relaxation-time data to determine the mean generation lifetime, τg, for electron-hole pairs. The first technique is an enhanced version of an existing method, while the second is a new technique that requires much less data processing and is much more reliable as an automated analysis tool
  • Keywords
    MOS capacitors; MOS integrated circuits; capacitance; carrier density; carrier lifetime; carrier relaxation time; circuit analysis computing; data analysis; integrated circuit reliability; integrated circuit testing; monitoring; surface contamination; MOS-C relaxation time; WLR testing; automated MOS-capacitor relaxation time analysis; automated analysis tool reliability; capacitor relaxation-time; capacitor relaxation-time data analysis; contaminants; data processing; deep depletion pulse treatment; electron-hole pairs; mean generation lifetime; metal oxide semiconductor capacitor; relaxation time; thermal equilibrium; wafer process monitoring; Automatic testing; Capacitance; Capacitors; Charge carrier density; Computerized monitoring; Equations; Laboratories; Nonlinear filters; Physics; Semiconductor device reliability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop Final Report, 1997 IEEE International
  • Conference_Location
    Lake Tahoe, CA
  • Print_ISBN
    0-7803-4205-4
  • Type

    conf

  • DOI
    10.1109/IRWS.1997.660303
  • Filename
    660303