DocumentCode :
3101344
Title :
Fabrication of PTFE-filled waveguide bandpass filter using SR direct etching
Author :
Kishihara, Mitsuyoshi ; Kato, Masaaki ; Ikeuchi, H. ; Murai, Kensuke ; Ukita, Y. ; Utsumi, Yuji ; Kawai, Takaaki ; Ohta, Isao
Author_Institution :
Okayama Prefectural University, Soja, Japan
fYear :
2010
fDate :
23-28 May 2010
Firstpage :
1
Lastpage :
1
Abstract :
"Summary form only given, as follows." A metallic waveguide is one of effective media for millimeter- and submillimeter-waves because of the advantage of low-loss. This paper describes trial fabrication of a PTFE-filled waveguide bandpass filter (BPF) with the use of the SR (synchrotron radiation) direct etching process of PTFE, sputter deposition of metal, and electroplating. PTFE is known as a difficult material to process at high precision. However, it has been reported that PTFE microstructures can be fabricated by the direct exposure to SR. In this paper, an iris-coupled waveguide BPF with 5-stage Chebyshev response is designed at Q-band, and the fabrication procedure for the PTFE-filled waveguide BPF is described. The measurement results of the fabricated BPF are shown.
Keywords :
Band pass filters; Microstructure; Multiplexing; Optical device fabrication; Passive filters; Sputter etching; Sputtering; Strontium; Submillimeter wave filters; Synchrotron radiation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Symposium Digest (MTT), 2010 IEEE MTT-S International
Conference_Location :
Anaheim, CA
ISSN :
0149-645X
Print_ISBN :
978-1-4244-6056-4
Electronic_ISBN :
0149-645X
Type :
conf
DOI :
10.1109/MWSYM.2010.5515524
Filename :
5515524
Link To Document :
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