• DocumentCode
    3101344
  • Title

    Fabrication of PTFE-filled waveguide bandpass filter using SR direct etching

  • Author

    Kishihara, Mitsuyoshi ; Kato, Masaaki ; Ikeuchi, H. ; Murai, Kensuke ; Ukita, Y. ; Utsumi, Yuji ; Kawai, Takaaki ; Ohta, Isao

  • Author_Institution
    Okayama Prefectural University, Soja, Japan
  • fYear
    2010
  • fDate
    23-28 May 2010
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    "Summary form only given, as follows." A metallic waveguide is one of effective media for millimeter- and submillimeter-waves because of the advantage of low-loss. This paper describes trial fabrication of a PTFE-filled waveguide bandpass filter (BPF) with the use of the SR (synchrotron radiation) direct etching process of PTFE, sputter deposition of metal, and electroplating. PTFE is known as a difficult material to process at high precision. However, it has been reported that PTFE microstructures can be fabricated by the direct exposure to SR. In this paper, an iris-coupled waveguide BPF with 5-stage Chebyshev response is designed at Q-band, and the fabrication procedure for the PTFE-filled waveguide BPF is described. The measurement results of the fabricated BPF are shown.
  • Keywords
    Band pass filters; Microstructure; Multiplexing; Optical device fabrication; Passive filters; Sputter etching; Sputtering; Strontium; Submillimeter wave filters; Synchrotron radiation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Symposium Digest (MTT), 2010 IEEE MTT-S International
  • Conference_Location
    Anaheim, CA
  • ISSN
    0149-645X
  • Print_ISBN
    978-1-4244-6056-4
  • Electronic_ISBN
    0149-645X
  • Type

    conf

  • DOI
    10.1109/MWSYM.2010.5515524
  • Filename
    5515524