Title : 
The impact of process parameter variations on the electrical characteristics of a RESURF LDMOS and its compact modeling
         
        
            Author : 
Fathipour, V. ; Mojab, A. ; Malakoutian, M.A. ; Fathipour, S. ; Fathipour, M.
         
        
            Author_Institution : 
Dept. of Electr. & Comput. Eng., Univ. of Tehran, Tehran, Iran
         
        
        
        
        
        
            Abstract : 
In this paper, we have investigated the effect of parameter variations on the electrical characteristics of a RESURF LDMOS. The rate of change in each of the electrical parameters such as cut off frequency, breakdown voltage and drain saturation current as a function of the process parameters has been obtained. Furthermore, a model for the device output characteristics is presented and is verified by numerical simulations. To design a high-frequency high-power transistor, an accurate model for the power transistor is required. Several models for the device output characteristics have been proposed [1-3]. A good model should behave properly in all regions of the transistor operation and include the effects of quasi-saturation, a phenomenon commonly seen in power transistors when operating at high gate voltages. The model used here, also includes effects such as self heating and saturation in the N-Drift region.
         
        
            Keywords : 
power MOSFET; N-drift region; RESURF LDMOS; electrical characteristics; high gate voltage; high-frequency high-power transistor; process parameter variation; transistor channel current; transistor operation; Doping; Mathematical model; Numerical models; Resistance; Semiconductor process modeling; Threshold voltage; Transistors;
         
        
        
        
            Conference_Titel : 
Semiconductor Device Research Symposium (ISDRS), 2011 International
         
        
            Conference_Location : 
College Park, MD
         
        
            Print_ISBN : 
978-1-4577-1755-0
         
        
        
            DOI : 
10.1109/ISDRS.2011.6135354