Title :
Technique for reducing on-resistance of high-voltage drivers based on stacked standard CMOS
Author :
Pashmineh, Sara ; Hongcheng Xu ; Killat, Dirk
Author_Institution :
Microelectron. Dept., Brandenburg Univ. of Technol. Cottbus, Brandenburg, Germany
Abstract :
This paper presents a new technique for reducing on-resistance of high-voltage drivers, which are based on N-stacked standard CMOS. A theory to calculate gate voltages of HV-driver transistors to drive the maximum drain current for minimum on-resistance is introduced. According to the calculated gate voltages, a circuit design methodology for generating them is described. This concept is technology independent and compatible with scaled CMOS devices. The theory and circuit design are proved by simulating a 2-stack CMOS driver in 65-nm technology, demonstrating significantly improved rise and fall times of the driver, if compared to previous work.
Keywords :
CMOS integrated circuits; driver circuits; power integrated circuits; 2-stack CMOS driver; HV-driver transistors; circuit design; circuit design methodology; drain current; gate voltages; high-voltage drivers; on-resistance reduction; scaled CMOS devices; size 65 nm; stacked standard CMOS; CMOS integrated circuits; Logic gates; MOSFET; Standards; Threshold voltage; Voltage control;
Conference_Titel :
Ph.D. Research in Microelectronics and Electronics (PRIME), 2013 9th Conference on
Conference_Location :
Villach
Print_ISBN :
978-1-4673-4580-4
DOI :
10.1109/PRIME.2013.6603145