DocumentCode :
3106120
Title :
Fabrication of PTFE-filled waveguide bandpass filter using SR direct etching
Author :
Kishihara, M. ; Kato, M. ; Ikeuchi, H. ; Murai, K. ; Ukita, Y. ; Utsumi, Y. ; Kawai, T. ; Ohta, I.
Author_Institution :
Okayama Prefectural Univ., Okayama, Japan
fYear :
2010
fDate :
23-28 May 2010
Firstpage :
1724
Lastpage :
1727
Abstract :
A metallic waveguide is one of effective media for millimeter- and submillimeter-waves because of the advantage of low-loss. This paper describes trial fabrication of a PTFE-filled waveguide bandpass filter (BPF) with the use of the SR (synchrotron radiation) direct etching process of PTFE, sputter deposition of metal, and electroplating. PTFE is known as a difficult material to process at high precision. However, it has been reported that PTFE microstructures can be fabricated by the direct exposure to SR. In this paper, an iris-coupled waveguide BPF with 5-stage Chebyshev response is designed at Q-band, and the fabrication procedure for the PTFE-filled waveguide BPF is described. The measurement results of the fabricated BPF are shown.
Keywords :
X-ray lithography; band-pass filters; synchrotron radiation; waveguide filters; PTFE-filled waveguide bandpass filter; Q-band; SR direct etching; fabrication procedure; submillimeter waves; synchrotron radiation; Band pass filters; Chebyshev approximation; Etching; Frequency; Millimeter wave technology; Optical device fabrication; Optical waveguide components; Optical waveguides; Scattering parameters; Strontium; X-ray lithography; bandpass filters; waveguide components dielectric waveguides; waveguide filters;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Symposium Digest (MTT), 2010 IEEE MTT-S International
Conference_Location :
Anaheim, CA
ISSN :
0149-645X
Print_ISBN :
978-1-4244-6056-4
Electronic_ISBN :
0149-645X
Type :
conf
DOI :
10.1109/MWSYM.2010.5515745
Filename :
5515745
Link To Document :
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