DocumentCode
3107419
Title
Extreme ultraviolet lithography using a four-mirror illumination optics
Author
Haga, Tatsuya ; Kinoshita, Hiroyuki
fYear
1995
fDate
10-14 July 1995
Firstpage
104
Keywords
Free electron lasers; Laboratories; Lighting; Lithography; Nonlinear optics; Optical bistability; Optical pulse generation; Ring lasers; Storage rings; Ultraviolet sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 1995. Technical Digest. CLEO/Pacific Rim'95., Pacific Rim Conference on
Conference_Location
Chiba, Japan
Print_ISBN
0-7803-2400-5
Type
conf
DOI
10.1109/CLEOPR.1995.521359
Filename
521359
Link To Document