DocumentCode :
3107419
Title :
Extreme ultraviolet lithography using a four-mirror illumination optics
Author :
Haga, Tatsuya ; Kinoshita, Hiroyuki
fYear :
1995
fDate :
10-14 July 1995
Firstpage :
104
Keywords :
Free electron lasers; Laboratories; Lighting; Lithography; Nonlinear optics; Optical bistability; Optical pulse generation; Ring lasers; Storage rings; Ultraviolet sources;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 1995. Technical Digest. CLEO/Pacific Rim'95., Pacific Rim Conference on
Conference_Location :
Chiba, Japan
Print_ISBN :
0-7803-2400-5
Type :
conf
DOI :
10.1109/CLEOPR.1995.521359
Filename :
521359
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3107419
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