DocumentCode

310831

Title

Plasma Charging Damage On Ultra-thin Gate Oxides

Author

Park, Donggun ; Hu, Chenming

Author_Institution

University of California at Berkeley

fYear

1997

fDate

13-14 May 1997

Firstpage

15

Lastpage

18

Keywords

MOS devices; MOSFETs; Paper technology; Plasma applications; Plasma devices; Plasma properties; Sputter etching; Testing; Threshold voltage; Tunneling;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Process-Induced Damage, 1997., 2nd International Symposium on

Conference_Location

Monterey, California, USA

Print_ISBN

0-9651-5771-7

Type

conf

DOI

10.1109/PPID.1997.596670

Filename

596670