DocumentCode

310839

Title

Analysis Of Injection Current Through Thin Gate Oxide During Metal Etch

Author

Kinoshita, Takashi ; Krishnan, Srikanth ; Dostalik, Willam W. ; McVittie, James P.

Author_Institution

Texas Instruments

fYear

1997

fDate

13-14 May 1997

Firstpage

45

Lastpage

48

Keywords

Analytical models; Boundary conditions; Electrons; Etching; Plasma applications; Plasma density; Plasma simulation; Steady-state; Surface charging; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Process-Induced Damage, 1997., 2nd International Symposium on

Conference_Location

Monterey, California, USA

Print_ISBN

0-9651-5771-7

Type

conf

DOI

10.1109/PPID.1997.596687

Filename

596687