• DocumentCode
    310840
  • Title

    General Dependence Of Electron Shading Damage On The Wafer Bias Power

  • Author

    Hashimoto, Koichi ; Shimpuku, Fumihiko ; Hasegawa, Akihiro ; Hikosaka, Yukinobu ; Nakamura, Moritaka

  • Author_Institution
    Fujitsu Limited
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    49
  • Lastpage
    51
  • Keywords
    Breakdown voltage; Electric breakdown; Electrons; Etching; Inductors; MOS capacitors; Plasma applications; Plasma sources; Resists; Ultra large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596688
  • Filename
    596688
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310840