• DocumentCode
    310842
  • Title

    Study Of Pattern Dependent Charging In A High-density, Inductively Coupled Metal Etcher

  • Author

    Patrick, Roger ; Jones, Phillip ; Lukaszek, Wes ; Shields, Jeffrey ; Birrell, Andrew

  • Author_Institution
    Lam Research Corporation
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    59
  • Lastpage
    62
  • Keywords
    Argon; Electrons; Etching; Plasma applications; Plasma density; Plasma measurements; Plasma sheaths; Resists; Surface charging; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596691
  • Filename
    596691
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310842