• DocumentCode
    310843
  • Title

    On the Link Between Electron Shadowing And Charging Damage

  • Author

    Hwang, Gyeong S. ; Giapis, Konstantinos P.

  • Author_Institution
    California Institute of Technology
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    63
  • Lastpage
    66
  • Keywords
    Electrons; Etching; Plasma applications; Plasma chemistry; Plasma density; Plasma materials processing; Plasma simulation; Plasma temperature; Shadow mapping; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596692
  • Filename
    596692
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310843