DocumentCode :
310845
Title :
Characteristics Of Contact Etching Damage Affecting The Contact Resistance Of AiSiCu/TiN/Ti/p+Si
Author :
Miyamoto, Kyoko ; Sugihara, Kohei ; Asai, Akira
Author_Institution :
Matushita Electronics Corporation
fYear :
1997
fDate :
13-14 May 1997
Firstpage :
73
Lastpage :
76
Keywords :
Contact resistance; Etching; Hafnium; Impurities; Laboratories; Plasma applications; Plasma immersion ion implantation; Plasma measurements; Silicon; Tin;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
Type :
conf
DOI :
10.1109/PPID.1997.596695
Filename :
596695
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=310845
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