DocumentCode :
310847
Title :
Plasma Etching Process Induced Poly Film Damage
Author :
Chu, Po-Tao ; Chen, Fang-Cheng ; Hung, Chih-Chien ; Chao, Ying-Chen
Author_Institution :
Taiwan Semiconductor Manufacturing Company
fYear :
1997
fDate :
13-14 May 1997
Firstpage :
77
Lastpage :
80
Keywords :
Etching; Optical films; Optical microscopy; Plasma applications; Plasma materials processing; Production; Random access memory; Scanning electron microscopy; Surfaces; Switches;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
Type :
conf
DOI :
10.1109/PPID.1997.596698
Filename :
596698
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=310847
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