Title :
Integrated Oxidation/anneal Processes To Treat Out The LDD Side Wall Stress From TEOS Spacer Anisotropic Etch
Author :
Ni, Chi-Fu ; Wu, Shen-Jhy ; Chang, Hui-Hua ; Lan, Chao-Yi ; Ho, Yen-Shih ; Harn, Yu-Chi ; Shu, Shun-Liang
Author_Institution :
Taiwan Semiconductor Manufacturing Company Ltd
Keywords :
Anisotropic magnetoresistance; Annealing; CMOS image sensors; CMOS process; Crystallization; Electrons; Etching; Oxidation; Plasma applications; Stress;
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
DOI :
10.1109/PPID.1997.596701
