Title :
Behaviors Of Plasma-induced Pre-tunneling Leakage Current In MOS Capacitor
Author :
Fukumoto, Y. ; Nishizuka, T. ; Ohmoto, S. ; Inoue, T. ; Nozawa, T. ; Nakaue, A.
Author_Institution :
Kobe Steel, Ltd.
Keywords :
Antenna measurements; Current measurement; Delay effects; Design for quality; Leakage current; MOS capacitors; Plasma devices; Plasma measurements; Stress; Voltage;
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
DOI :
10.1109/PPID.1997.596705
