• DocumentCode
    310853
  • Title

    Characterization Of The Plasma-induced Effective Mobility Degradation Of LATID NMOSFETs

  • Author

    Lou, C.L. ; Song, J. ; Tan, C.B. ; Chim, W.K. ; Chan, D.S.H. ; Pan, Y.

  • Author_Institution
    National University of Singapore
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    102
  • Lastpage
    104
  • Keywords
    CMOS process; Degradation; MOSFETs; Plasma applications; Plasma density; Plasma devices; Plasma materials processing; Plasma measurements; Transconductance; Tungsten;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596706
  • Filename
    596706
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310853