Title :
Characterization Of The Plasma-induced Effective Mobility Degradation Of LATID NMOSFETs
Author :
Lou, C.L. ; Song, J. ; Tan, C.B. ; Chim, W.K. ; Chan, D.S.H. ; Pan, Y.
Author_Institution :
National University of Singapore
Keywords :
CMOS process; Degradation; MOSFETs; Plasma applications; Plasma density; Plasma devices; Plasma materials processing; Plasma measurements; Transconductance; Tungsten;
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
DOI :
10.1109/PPID.1997.596706
