DocumentCode :
310858
Title :
Characterization Of Wafer Charging In ECR Etching
Author :
Lukaszek, Wes
Author_Institution :
Wafer Charging Monitors, Inc.
fYear :
1997
fDate :
13-14 May 1997
Firstpage :
119
Lastpage :
122
Keywords :
Current density; EPROM; Etching; Plasma applications; Plasma devices; Plasma properties; Plasma sources; Resistors; Sensor phenomena and characterization; Surface charging;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
Type :
conf
DOI :
10.1109/PPID.1997.596713
Filename :
596713
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=310858
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