• DocumentCode
    310858
  • Title

    Characterization Of Wafer Charging In ECR Etching

  • Author

    Lukaszek, Wes

  • Author_Institution
    Wafer Charging Monitors, Inc.
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    119
  • Lastpage
    122
  • Keywords
    Current density; EPROM; Etching; Plasma applications; Plasma devices; Plasma properties; Plasma sources; Resistors; Sensor phenomena and characterization; Surface charging;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596713
  • Filename
    596713
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310858