DocumentCode :
310861
Title :
Relationship Between The Charging Damage Of Test Structures And The Deposited Charge On Unpatterned Wafers
Author :
Cismaru, C. ; Shohet, J.L. ; Nauka, K. ; Friedmann, J.B.
Author_Institution :
University of Wisconsin-Madison
fYear :
1997
fDate :
13-14 May 1997
Firstpage :
131
Lastpage :
134
Keywords :
Electric breakdown; MOS capacitors; Magnetic resonance; Plasma applications; Plasma devices; Plasma materials processing; Plasma measurements; Plasma sources; Surface charging; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
Type :
conf
DOI :
10.1109/PPID.1997.596718
Filename :
596718
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=310861
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