Title :
Correlation Of Nitride Spacer Plasma Damage Results From Conventional Gate Capacitor Electrical Tests And A New, Non-contact Approach
Author :
Goss, Michael W. ; Findlay, Andrew
Author_Institution :
Digital Semiconductor
Keywords :
Capacitors; Etching; Plasma applications; Plasma devices; Plasma diagnostics; Plasma materials processing; Plasma measurements; Plasma stability; Pulse measurements; Testing;
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
DOI :
10.1109/PPID.1997.596719
