• DocumentCode
    310865
  • Title

    Sporadic Charging In Interlevel Oxide Deposition In Conventional Plasma And HDP Deposition Systems

  • Author

    Hook, T.B. ; Stamper, A. ; Armbrust, D.

  • Author_Institution
    IBM Microelectronics Division
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    149
  • Lastpage
    152
  • Keywords
    Antenna measurements; CMOS technology; Chemical technology; Dielectrics; Electrons; Isolation technology; Plasma applications; Plasma devices; Stress; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596724
  • Filename
    596724
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310865