DocumentCode :
310865
Title :
Sporadic Charging In Interlevel Oxide Deposition In Conventional Plasma And HDP Deposition Systems
Author :
Hook, T.B. ; Stamper, A. ; Armbrust, D.
Author_Institution :
IBM Microelectronics Division
fYear :
1997
fDate :
13-14 May 1997
Firstpage :
149
Lastpage :
152
Keywords :
Antenna measurements; CMOS technology; Chemical technology; Dielectrics; Electrons; Isolation technology; Plasma applications; Plasma devices; Stress; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
Type :
conf
DOI :
10.1109/PPID.1997.596724
Filename :
596724
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=310865
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