MERIE Metal Etcher Induced Device Degradation And Subsequent Magnetic Field Enhancement Characterization

Author

Yu, Shaun T. ; Ku, S.M. ; Chiang, A.M. ; Shu, H.J. ; Chen, P.H. ; De Zaldivar, Jose Solo

Author_Institution

Taiwan Semiconductor Manufacturing Corporation

fYear

1997

fDate

13-14 May 1997

Firstpage

153

Lastpage

156

Keywords

Ambient intelligence; Degradation; Diodes; Etching; MOSFET circuits; Magnetic fields; Plasma measurements; Production; Protection; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Process-Induced Damage, 1997., 2nd International Symposium on

Conference_Location

Monterey, California, USA

Print_ISBN

0-9651-5771-7

Type

DOI

10.1109/PPID.1997.596726

Filename

596726

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