• DocumentCode
    310870
  • Title

    CMOS-circuit Protection Against PPID For Yield Enhancement

  • Author

    Andrews, Peter ; Blaum, Alfred

  • Author_Institution
    Motorola European Analog Technology Center
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    167
  • Lastpage
    170
  • Keywords
    CMOS technology; Capacitors; Diodes; Driver circuits; Etching; Integrated circuit noise; Plasma applications; Plasma materials processing; Plasma sources; Protection;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596730
  • Filename
    596730
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310870