Title :
CMOS-circuit Protection Against PPID For Yield Enhancement
Author :
Andrews, Peter ; Blaum, Alfred
Author_Institution :
Motorola European Analog Technology Center
Keywords :
CMOS technology; Capacitors; Diodes; Driver circuits; Etching; Integrated circuit noise; Plasma applications; Plasma materials processing; Plasma sources; Protection;
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
DOI :
10.1109/PPID.1997.596730