DocumentCode :
310870
Title :
CMOS-circuit Protection Against PPID For Yield Enhancement
Author :
Andrews, Peter ; Blaum, Alfred
Author_Institution :
Motorola European Analog Technology Center
fYear :
1997
fDate :
13-14 May 1997
Firstpage :
167
Lastpage :
170
Keywords :
CMOS technology; Capacitors; Diodes; Driver circuits; Etching; Integrated circuit noise; Plasma applications; Plasma materials processing; Plasma sources; Protection;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
Type :
conf
DOI :
10.1109/PPID.1997.596730
Filename :
596730
Link To Document :
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