Title :
Reduction Of Charging Damage Through Substrate Potential Control
Author :
Sakai, Itsuko ; Sekine, Makoto
Author_Institution :
Toshiba Corp.
Keywords :
Capacitors; Cathodes; Electrons; Magnetic field measurement; Magnetic fields; Magnetic flux; Plasma measurements; Polyimides; Substrates; Voltage;
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
DOI :
10.1109/PPID.1997.596732
