Title :
Device And Circuit Degradation Due To Plasma Damage
Author :
Viswanathan, C.R.
Author_Institution :
UCLA
Keywords :
Charge carrier processes; Circuits; Degradation; Electron traps; Plasma applications; Plasma devices; Plasma materials processing; Plasma simulation; Threshold voltage; Tunneling;
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
DOI :
10.1109/PPID.1997.596736
