Title :
Fast-turnaround Plasma Charging Damage Monitor: Method And Application To A Metal Etch And Resist Strip Process
Author :
Werking, James ; Bersuker, Gennadi ; Chan, Y.David
Author_Institution :
SEMATECH
Keywords :
Etching; Monitoring; Plasma applications; Plasma devices; Plasma immersion ion implantation; Plasma measurements; Plasma temperature; Resists; Stress; Testing;
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
DOI :
10.1109/PPID.1997.596742
