• DocumentCode
    310880
  • Title

    Correlation Of Plasma-induced Charging Voltage Measured In-situ By Microelectromechanical Sensors With Device Degradation

  • Author

    Pangal, Kiran ; Sturm, J.C.

  • Author_Institution
    Princeton University
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    203
  • Lastpage
    206
  • Keywords
    Degradation; Laser beams; MOS capacitors; Plasma applications; Plasma devices; Plasma displays; Plasma materials processing; Plasma measurements; Surface charging; Voltage measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596745
  • Filename
    596745
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310880