Title :
Correlation Between Electron Temperature Uniformity And Charging Damage In High Density Plasma Etching Tool
Author :
Tokashiki, K. ; Noguchi, K. ; Miyamoto, H. ; Horiuchi, T.
Author_Institution :
NEC Corp.
Keywords :
Current density; Design for quality; Electrons; Etching; Plasma applications; Plasma density; Plasma devices; Plasma diagnostics; Plasma temperature; Voltage;
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
DOI :
10.1109/PPID.1997.596746
