Title :
Investigation Of Edge Damage Using Localized Charge Injection
Author :
Sridharan, Anand ; Brozek, Tomasz ; Werking, James ; Viswanathan, Chand R.
Author_Institution :
University of California, Los Angeles
Keywords :
Etching; MOSFETs; Monitoring; Plasma applications; Plasma devices; Plasma materials processing; Plasma measurements; Plasma temperature; Thickness measurement; Voltage;
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
DOI :
10.1109/PPID.1997.596748
