• DocumentCode
    310882
  • Title

    Investigation Of Edge Damage Using Localized Charge Injection

  • Author

    Sridharan, Anand ; Brozek, Tomasz ; Werking, James ; Viswanathan, Chand R.

  • Author_Institution
    University of California, Los Angeles
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    211
  • Lastpage
    214
  • Keywords
    Etching; MOSFETs; Monitoring; Plasma applications; Plasma devices; Plasma materials processing; Plasma measurements; Plasma temperature; Thickness measurement; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596748
  • Filename
    596748
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310882