DocumentCode :
310883
Title :
A New Evaluation Technique Of Plasma-induced Si Substrate Damage By Photoreflectance Spectroscopy
Author :
Eriguchi, Koji ; Imai, Takaaki ; Asai, Akira ; Okuyama, Masanori
Author_Institution :
Matsushita Electric Ind. Co., Ltd.
fYear :
1997
fDate :
13-14 May 1997
Firstpage :
215
Lastpage :
218
Keywords :
Electric variables measurement; Etching; Optical surface waves; Plasma applications; Plasma materials processing; Plasma measurements; Plasma properties; Pollution measurement; Spectroscopy; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
Type :
conf
DOI :
10.1109/PPID.1997.596749
Filename :
596749
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=310883
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