DocumentCode :
310885
Title :
Dry Etching Damage In Pt/Pb(Zr, Ti)O3/Pt Capacitors Patterned By A Single Photolithography Process Step
Author :
Kumihashi, Takao ; Kawakami, Hiroshi ; Torii, Kentaro ; Suga, Mitsuo ; Kure, Tokuo
Author_Institution :
Hitachi Ltd.
fYear :
1997
fDate :
13-14 May 1997
Firstpage :
221
Lastpage :
224
Keywords :
Amorphous materials; Area measurement; Argon; Capacitors; Dry etching; Leakage current; Lithography; Plasma applications; Radio frequency; Scanning electron microscopy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
Type :
conf
DOI :
10.1109/PPID.1997.596752
Filename :
596752
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=310885
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