Title :
Evaluation And Reduction Of Plasma Damage In A High-density, Inductively Coupled Metal Etcher
Author :
Colonell, J.I. ; Downey, S.W. ; Kook, T. ; Patrick, R. ; Siu, S. ; Jones, P.L.
Author_Institution :
Bell Laboratories
Keywords :
Antenna measurements; Coils; Electron traps; Etching; Plasma applications; Plasma measurements; Plasma waves; Radio frequency; Testing; Tin;
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
DOI :
10.1109/PPID.1997.596756
