• DocumentCode
    310888
  • Title

    Evaluation And Reduction Of Plasma Damage In A High-density, Inductively Coupled Metal Etcher

  • Author

    Colonell, J.I. ; Downey, S.W. ; Kook, T. ; Patrick, R. ; Siu, S. ; Jones, P.L.

  • Author_Institution
    Bell Laboratories
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    229
  • Lastpage
    232
  • Keywords
    Antenna measurements; Coils; Electron traps; Etching; Plasma applications; Plasma measurements; Plasma waves; Radio frequency; Testing; Tin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596756
  • Filename
    596756
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310888