Title :
A Study Of The Influence Of Gas Chemistry On Notching In Metal Etching
Author :
Tabara, Suguru ; Khayama, Y. ; Hatakeyama, Tadao ; Katsuragi, Ken ; Tanabe, Masafumi
Author_Institution :
YAMAHA Corporation
Keywords :
Capacitors; Chemistry; Etching; Gases; Helium; Plasma applications; Plasma devices; Plasma measurements; Resists; Voltage;
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
DOI :
10.1109/PPID.1997.596757
