• DocumentCode
    310890
  • Title

    Study Of Plasma Charging And Photoresist Coating Effects Using UV-erased FLASH Cell As Charging Sensor

  • Author

    Alba, S. ; Colognese, A. ; Ghio, E. ; Maugain, F. ; Rivera, G.

  • Author_Institution
    SGS-Thomson Microelectronics
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    237
  • Lastpage
    240
  • Keywords
    Coatings; Current measurement; Etching; Flash memory cells; Microelectronics; Plasma applications; Plasma measurements; Plasma properties; Resists; Sensor phenomena and characterization;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596759
  • Filename
    596759
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310890