DocumentCode :
310890
Title :
Study Of Plasma Charging And Photoresist Coating Effects Using UV-erased FLASH Cell As Charging Sensor
Author :
Alba, S. ; Colognese, A. ; Ghio, E. ; Maugain, F. ; Rivera, G.
Author_Institution :
SGS-Thomson Microelectronics
fYear :
1997
fDate :
13-14 May 1997
Firstpage :
237
Lastpage :
240
Keywords :
Coatings; Current measurement; Etching; Flash memory cells; Microelectronics; Plasma applications; Plasma measurements; Plasma properties; Resists; Sensor phenomena and characterization;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
Type :
conf
DOI :
10.1109/PPID.1997.596759
Filename :
596759
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=310890
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