DocumentCode :
310892
Title :
A Model For Photoresist-induced Charging Damage In Ultra-thin Gate Oxides
Author :
Lin, Horng-Chih ; Chien, Chao-Hsing ; Wang, Meng-Feng ; Huang, Tiao-Yuan ; Chang, Chun-Yen
Author_Institution :
National Chiao-Tung University
fYear :
1997
fDate :
13-14 May 1997
Firstpage :
247
Lastpage :
250
Keywords :
Chaos; Plasma applications; Plasma devices; Plasma immersion ion implantation; Plasma materials processing; Plasma sources; Plasma temperature; Resists; Testing; Wet etching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
Type :
conf
DOI :
10.1109/PPID.1997.596761
Filename :
596761
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=310892
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