Title :
Studies Of Plasma Uniformity And Global Wafer Charging In A High Density, Inductively Coupled Metal Etcher
Author :
Patrick, Roger ; Jones, Phillip ; En, William
Author_Institution :
Lam Research Corporation
Keywords :
Argon; Coils; Current measurement; EPROM; Plasma density; Plasma devices; Plasma measurements; Surface charging; Voltage measurement;
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
DOI :
10.1109/PPID.1997.596765
