Title :
A 120-Gbit/s 520-mVPP multiplexer IC using 1-µm self-aligned InP/InGaAs/InP DHBT with emitter mesa passivation ledge
Author :
Arayashiki, Y. ; Ohkubo, Y. ; Matsumoto, T. ; Koji, T. ; Amano, Y. ; Takagi, A. ; Matsuoka, Y.
Author_Institution :
Anritsu Devices Co., Ltd., Atsugi, Japan
fDate :
May 31 2010-June 4 2010
Abstract :
We fabricated 2:1 multiplexer IC (MUX) with a retiming function by using 1-μm self-aligned InP/InGaAs/InP double heterostructure bipolar transistors (DHBTs). As a result of the high performance DHBTs and the circuit design, in which we implemented broadband impedance matching, the MUX operated at 120 Gbit/s with a power dissipation of 1.27 W and an output amplitude of 520 mV when measured on the wafer. The MUX was assembled in a module using V-connectors for practical use. In this module, the MUX operated at 113 Gbit/s with an output amplitude of 514 mW and a power dissipation of 1.4 W.
Keywords :
III-V semiconductors; bipolar integrated circuits; gallium arsenide; heterojunction bipolar transistors; high-speed integrated circuits; indium compounds; integrated circuit design; microassembling; multiplexing equipment; optical communication; passivation; semiconductor heterojunctions; InP-InGaAs-InP; MUX; V-connectors; assembly; bit rate 113 Gbit/s; bit rate 120 Gbit/s; circuit design; double heterostructure bipolar transistors; emitter mesa passivation ledge; implemented broadband impedance matching; module; multiplexer IC; optical communication; output amplitude; power 1.27 W; power 1.4 W; power 514 mW; power dissipation; retiming function; self-aligned DHBT; size 1 mum; voltage 520 mV; wafer; Bipolar integrated circuits; Bipolar transistors; Circuit synthesis; Double heterojunction bipolar transistors; Impedance matching; Impedance measurement; Indium gallium arsenide; Indium phosphide; Multiplexing; Power dissipation;
Conference_Titel :
Indium Phosphide & Related Materials (IPRM), 2010 International Conference on
Conference_Location :
Kagawa
Print_ISBN :
978-1-4244-5919-3
DOI :
10.1109/ICIPRM.2010.5515958