Title :
Formation of two-dimensional photonic crystals by electron-beam lithography
Author :
Utkin, Dmitry E. ; Nasimov, Dmitry A.
Author_Institution :
A.V. Rzhanov Inst. of Semicond. Phys., SB RAS, Novosibirsk, Russia
fDate :
June 30 2011-July 4 2011
Abstract :
The approach to formation of two-dimensional photonic crystals with preset sizes of elements by the electron-beam lithography (EBL) is presented. The main problems appearing during formation of these structures are considered.
Keywords :
electron beam lithography; photonic crystals; EBL; electron-beam lithography; two-dimensional photonic crystals; Design automation; Lithography; Photonic crystals; Proximity effect; Resists; Silicon; Solid modeling; Photonic crystal; lithography; proximity effect;
Conference_Titel :
Micro/Nanotechnologies and Electron Devices (EDM), 2011 International Conference and Seminar of Young Specialists on
Conference_Location :
Erlagol, Altai
Print_ISBN :
978-1-61284-793-1
DOI :
10.1109/EDM.2011.6006911
