Title :
Monte Carlo study of strain effect on high field electron transport in InAs and InSb
Author :
Nishino, H. ; Kawahira, I. ; Machida, F. ; Hara, S. ; Fujishiro, H.I.
Author_Institution :
Dept. of Appl. Electron., Tokyo Univ. of Sci., Chiba, Japan
fDate :
May 31 2010-June 4 2010
Abstract :
We calculate the unstrained and the strained band structures of InAs and InSb by means of the empirical pseudopotential method. The impact ionization threshold energy, Eth, is calculated while keeping the energy and momentum conservation. Then the electron transport in the unstrained and the strained InAs and InSb is investigated by using the Monte Carlo (MC) method. In both InAs and InSb, the average electron velocity, vd, increases monotonically with the electric field strength, f. The tensile strain makes the low field electron mobility, μ, higher, and vice versa, which is resulted from the dependence of the effective mass in the Γ valley, m||*(Γ), on the strain. At the high f, many electrons are restricted within the bottom of the Γ valley because of losing most of their energy by the impact ionization, which results in keeping vd large at the high f. The tensile strain makes Eth smaller and then the impact ionization coefficient, α, larger, and vice versa. Consequently, vd at the high f becomes larger under the tensile strain and smaller under the compressive strain.
Keywords :
Monte Carlo methods; band structure; electron mobility; impact ionisation; indium compounds; momentum; InAs; InSb; Monte Carlo method; average electron velocity; compressive strain; effective mass; electron transport; empirical pseudopotential method; impact ionization threshold energy; low field electron mobility; momentum conservation; strained band structures; tensile strain; Capacitive sensors; Effective mass; Electron mobility; III-V semiconductor materials; Impact ionization; Lattices; Monte Carlo methods; Optical scattering; Substrates; Tensile strain;
Conference_Titel :
Indium Phosphide & Related Materials (IPRM), 2010 International Conference on
Conference_Location :
Kagawa
Print_ISBN :
978-1-4244-5919-3
DOI :
10.1109/ICIPRM.2010.5516023