DocumentCode
3112171
Title
A personal historical perspective of ion implantation equipment for semiconductor applications
Author
Mckenna, Charles M.
fYear
2000
fDate
2000
Firstpage
1
Lastpage
19
Abstract
This chapter is a personal rumination on the various factors that spawned and influenced the commercial ion implantation equipment business over the last thirty years. In particular, the details of several high current implanters developed internally at Western Electric, IBM and Hughes are recounted. Also, certain recurring factors will be correlated with the relative success of certain products and product types. As this is all considered from a uniquely singular perspective, the author apologizes in advance for any errors of omission or commission relative to the official historical record
Keywords
history; ion implantation; Hughes; IBM; Western Electric; commercial ion implantation equipment business; high current implanters; historical review; semiconductor applications; Business; Electrostatics; Europe; Ion accelerators; Ion beams; Ion implantation; Laboratories; Nuclear physics; Nuclear power generation; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology, 2000. Conference on
Conference_Location
Alpbach
Print_ISBN
0-7803-6462-7
Type
conf
DOI
10.1109/.2000.924079
Filename
924079
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