• DocumentCode
    3112171
  • Title

    A personal historical perspective of ion implantation equipment for semiconductor applications

  • Author

    Mckenna, Charles M.

  • fYear
    2000
  • fDate
    2000
  • Firstpage
    1
  • Lastpage
    19
  • Abstract
    This chapter is a personal rumination on the various factors that spawned and influenced the commercial ion implantation equipment business over the last thirty years. In particular, the details of several high current implanters developed internally at Western Electric, IBM and Hughes are recounted. Also, certain recurring factors will be correlated with the relative success of certain products and product types. As this is all considered from a uniquely singular perspective, the author apologizes in advance for any errors of omission or commission relative to the official historical record
  • Keywords
    history; ion implantation; Hughes; IBM; Western Electric; commercial ion implantation equipment business; high current implanters; historical review; semiconductor applications; Business; Electrostatics; Europe; Ion accelerators; Ion beams; Ion implantation; Laboratories; Nuclear physics; Nuclear power generation; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ion Implantation Technology, 2000. Conference on
  • Conference_Location
    Alpbach
  • Print_ISBN
    0-7803-6462-7
  • Type

    conf

  • DOI
    10.1109/.2000.924079
  • Filename
    924079