Title :
A personal historical perspective of ion implantation equipment for semiconductor applications
Author :
Mckenna, Charles M.
Abstract :
This chapter is a personal rumination on the various factors that spawned and influenced the commercial ion implantation equipment business over the last thirty years. In particular, the details of several high current implanters developed internally at Western Electric, IBM and Hughes are recounted. Also, certain recurring factors will be correlated with the relative success of certain products and product types. As this is all considered from a uniquely singular perspective, the author apologizes in advance for any errors of omission or commission relative to the official historical record
Keywords :
history; ion implantation; Hughes; IBM; Western Electric; commercial ion implantation equipment business; high current implanters; historical review; semiconductor applications; Business; Electrostatics; Europe; Ion accelerators; Ion beams; Ion implantation; Laboratories; Nuclear physics; Nuclear power generation; Voltage;
Conference_Titel :
Ion Implantation Technology, 2000. Conference on
Conference_Location :
Alpbach
Print_ISBN :
0-7803-6462-7
DOI :
10.1109/.2000.924079